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6 inch Sapphire substrate

Specific Information
Sapphire plays a crucial role in specific applications, such as serving as substrates for lasers and photodetectors, as well as substrates for LEDs in the optoelectronics field. Moreover, in semiconductor manufacturing, sapphire substrates are utilized to produce high-performance silicon-based LEDs and power devices. JXT, as a leading sapphire wafer supplier, provides high-quality sapphire products to meet the demands of various applications, ensuring customers achieve reliable performance and results in the fields of optoelectronics and semiconductor industries.
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  • specification
  • Properties
  • ItemSapphire Substrate(1~8inch)
    Diameter25.4±0.1mm50.8±0.1mm76.2±0.2mm100.0±0.2mm125.0±0.3mm150.0±0.3mm200.0±0.5mm
    Thickness430±25μm430±25μm500±25μm650±25μm800±25μm1000±25μm1600±25μm
    Surface OrientationC-plane (0001) off-angle toward M-axis(10-10) 0.2 ± 0.1°
    C-plane (0001) off-angle toward A-axis(11-20) 0 ± 0.1°
    Primary Flat OrientationA-Plane (11-20) ± 1.0°
    Primary Flat Length8.0±1.0mm16.0±1.0mm22.0±1.0mm30.0±1.0mm30.0±2.0mm47.5±2.0mmNotch
    Front Surface FinishEpi-polished,Ra<0.3nm
    Back Surface FinishSSP:Fine-ground,Ra=0.8-1.2μm; DSP:Epi-polished,Ra<0.3nm
    Laser MarkBack side
    TTV≤5μm≤8μm≤10μm≤10μm≤15μm≤20μm≤30μm
    BOW≤8μm≤10μm≤12μm≤15μm≤25μm≤25μm≤40μm
    WARP≤10μm≤12μm≤15μm≤20μm≤30μm≤30μm≤60μm
    Edge Exclusion≤2 mm


    Customization specifications:

    * Various orientations such as A/R/M/N Plane, C off M(1°-10°), C off A(1°-10°).

    * Various sizes and shapes such as 10*10mm,12inch

    * Various thicknesses:0.1~20mm

    * Various surface roughness such as slicing,lapping,polishing.

    * Sapphire crystal ingots are available.


  • The sapphire is a crystalline form of aluminum oxide(α-Al2O3) with a hexagonal structure, which is composed of three oxygen atoms and two aluminum atoms combined by covalent bonds. The chemical properties of sapphire crystal are very stable, insoluble in water, and excellent corrosion resistance to strong acids and strong alkalis. The sapphire crystal has a high hardness of 9 on the Mohs scale, a melting point of 2050°C, a boiling point of 3500°C, and a maximum working temperature of 1900°C. Sapphire wafer has high light transmission,low thermal conductivity,good electrical insulation,excellent mechanical properties, and good wear resistance and scratch resistance.


    Crystal StructureHexagonal
    Lattice Constant(nm)a=4.76Å c=12.99Å
    Density(g/cm3)3.98
    Melting point(℃)2040
    Mohs Hardness(mohs)9
    Dielectric Constant9.3(A plane)
    11.5(C plane)
    Thermal Conductivity(W/cm.K)0.46
    Thermal Expansion 6.7*10-6/k(C plane)           5.0*10-6/k(A plane)
    Refractive Index 1.762-1.777
    Transmission Test sample:Sapphire:D76.2*4mm
    UV:200~380nm  74%~84%
    Visible light:380~760nm  85% 
    Infrared:760~1000nm      85%
    Far-Infrared:>1000nm   80%~100%


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